The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2023
Filed:
Jan. 20, 2021
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, KR;
Inventors:
Jaeyeol Baek, Suwon-si, KR;
Soonhyung Kwon, Suwon-si, KR;
Minsoo Kim, Suwon-si, KR;
Hyeon Park, Suwon-si, KR;
Shinhyo Bae, Suwon-si, KR;
Daeseok Song, Suwon-si, KR;
Yoojeong Choi, Suwon-si, KR;
Assignee:
Samsung SDI Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/26 (2006.01); C07D 251/32 (2006.01); G03F 7/16 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C07D 251/32 (2013.01); G03F 7/0045 (2013.01); G03F 7/168 (2013.01); G03F 7/26 (2013.01);
Abstract
A resist underlayer composition includes a polymer including a structural unit represented by Chemical Formula 1, and a solvent. A method of forming patterns uses the resist underlayer composition under a photoresist pattern to enhance the sensitivity of the photoresist to an exposure light source, thereby providing enhanced resolution and faster processing times.