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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11675270 B1

PDFFull Text
Date of Patent:
Jun. 13, 2023

Filed:

Sep. 15, 2017

Resist underlayer film-forming composition

Applicant:

Nissan Chemical Corporation, Tokyo, JP;

Inventors:

Tokio Nishita, Toyama, JP;

Rikimaru Sakamoto, Toyama, JP;

Assignee:

NISSAN CHEMICAL CORPORATION, Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/09 (2006.01); C08F 220/22 (2006.01); C08F 220/24 (2006.01); C08F 220/30 (2006.01); C08F 220/36 (2006.01); C09D 133/14 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); C08F 220/18 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08F 220/22 (2013.01); C08F 220/24 (2013.01); C08F 220/302 (2020.02); C08F 220/365 (2020.02); C09D 133/14 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/2006 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); C08F 220/1811 (2020.02); C08F 220/301 (2020.02); C08F 220/303 (2020.02); C08F 2800/20 (2013.01);
Abstract

A resist underlayer film-forming composition for lithography including a copolymer having a structural unit of the following Formula (1) to Formula (3), a crosslinking agent, an organic acid catalyst, and a solvent: (wherein Rs are independently a hydrogen atom or a methyl group, Ris a Calkylene group, A is a protective group, Ris an organic group having a 4-membered ring to 7-membered ring lactone framework, adamantane framework, tricyclodecane framework or norbornane framework, Ris a linear, branched or cyclic organic group having a carbon atom number of 1 to 12 in which at least one hydrogen atom is substituted with a fluoro group and which optionally has at least one hydroxy group as a substituent).

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