The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2023
Filed:
Oct. 31, 2022
Aeva, Inc., Mountain View, CA (US);
Cameron Howard, Bend, OR (US);
Sawyer Isaac Cohen, Menlo Park, CA (US);
Keith Gagne, Santa Clara, CA (US);
Bradley Scot Levin, San Jose, CA (US);
Pierre Hicks, San Francisco, CA (US);
Aeva, Inc., Mountain View, CA (US);
Abstract
A system and method include receiving a first beam pattern from an optical source that comprises a plurality of optical beams transmitted towards a target causing different spaces to form between each optical beam. The system and method include measuring a vertical angle between at least two of the optical beams along a first axis and calculating a second beam pattern based on the vertical angle and a pivot point that causes the optical beams to be transmitted towards the target with substantially uniform spacing. The system and method include adjusting, at the pivot point, one or more components to form the second beam pattern to adjust the plurality of different spaces to the substantially uniform spacing for transmission towards the target. The system and method include receiving return optical beams from the target to produce a plurality of points to form the point cloud.