The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2023

Filed:

Mar. 27, 2019
Applicant:

Hutchinson Technology Incorporated, Hutchinson, MN (US);

Inventors:

Douglas P. Riemer, Waconia, MN (US);

Peter F. Ladwig, Hutchinson, MN (US);

Assignee:

Hutchinson Technology Incorporated, Hutchinson, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 3/48 (2006.01); C25D 3/62 (2006.01); C25D 5/04 (2006.01); C25D 5/18 (2006.01); C25D 7/00 (2006.01); H05K 3/18 (2006.01); H05K 1/09 (2006.01); C25D 5/10 (2006.01); C25D 5/00 (2006.01);
U.S. Cl.
CPC ...
C25D 7/00 (2013.01); C25D 3/48 (2013.01); H05K 1/09 (2013.01); H05K 3/188 (2013.01); C25D 5/10 (2013.01); C25D 5/623 (2020.08); H05K 2201/0347 (2013.01); H05K 2203/0723 (2013.01);
Abstract

A method of plating a copper substrate with gold that reduces or eliminates the presence of microvoids at the interface of the gold/copper substrate is described. Suitably, live entry of the substrate into the plating bath is performed with application of external current to the bath such that no portion of the substrate is exposed to the bath for more than one second without the application of the external current. Increase of the applied current for gold strike to the mass-transfer-limit for gold reduction accomplishes the full measure of improvement in eliminating microvoids.


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