The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2023

Filed:

Apr. 22, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Jonathan Frankel, Los Gatos, CA (US);

Colin C. Neikirk, Sunnyvale, CA (US);

Pravin K. Narwankar, Sunnyvale, CA (US);

Quoc Truong, San Ramon, CA (US);

Govindraj Desai, Karnataka, IN;

Sekar Krishnasamy, Bangalore, IN;

Shrikant Swaminathan, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/455 (2006.01); B01J 19/00 (2006.01); B01J 19/18 (2006.01); B01F 27/051 (2022.01); B01F 27/70 (2022.01); B01F 27/07 (2022.01); B01F 27/112 (2022.01); B01F 27/072 (2022.01);
U.S. Cl.
CPC ...
C23C 16/4417 (2013.01); B01F 27/051 (2022.01); B01F 27/074 (2022.01); B01F 27/0726 (2022.01); B01F 27/112 (2022.01); B01F 27/70 (2022.01); B01J 19/0066 (2013.01); B01J 19/18 (2013.01); C23C 16/45555 (2013.01);
Abstract

A reactor for coating particles includes a stationary vacuum chamber having a lower portion that forms a half-cylinder and an upper portion to hold a bed of particles to be coated, a vacuum port in the upper portion of the chamber, a paddle assembly, a motor to rotate a drive shaft of the paddle assembly, a chemical delivery system to deliver a first fluid, and a first gas injection assembly to receive the first fluid from the chemical delivery system and having apertures configured to inject a first reactant or precursor gas into the lower portion of the chamber and such that the first reactant or precursor gas flows substantially tangent to a curved inner surface of the half-cylinder.


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