The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2023

Filed:

Dec. 22, 2017
Applicants:

Conax Technologies, Buffalo, NY (US);

Alfred University, Alfred, NY (US);

Inventors:

Matthew M. Hall, Mendon, NY (US);

Timothy Keenan, Wellsville, NY (US);

Lana Margaret Placek, Niagara Falls, NY (US);

Scott Michael Kroon, Orchard Park, NY (US);

William Sean Halligan, Boston, NY (US);

Michael Edward Ferraro, Lockport, NY (US);

Assignees:

CONAX TECHNOLOGIES, Buffalo, NY (US);

Alfred University, Alfred, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C03C 17/22 (2006.01); C23C 18/12 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4404 (2013.01); C03C 17/22 (2013.01); C23C 18/127 (2013.01); C23C 18/1216 (2013.01); C03C 2217/286 (2013.01); C03C 2218/111 (2013.01);
Abstract

Disclosed are barrier coatings for fused silica components used in semiconductor processing. In particular, the present disclosure concerns protective substrate-barrier coatings composed of corrosion-resilient metal compounds which provide superior resistance to erosion/corrosion when a coated substrate is subjected to the acidic environments at elevated temperatures typical for semiconductor processing.


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