The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2023
Filed:
Jul. 29, 2016
Nitto Denko Corporation, Ibaraki, JP;
Daisuke Hattori, Ibaraki, JP;
Hiromoto Haruta, Ibaraki, JP;
Kozo Nakamura, Ibaraki, JP;
Hiroyuki Takemoto, Ibaraki, JP;
NITTO DENKO CORPORATION, Ibaraki, JP;
Abstract
The present invention is intended to provide a laminated film including a void-provided layer achieving both a high proportion of void space and a high film strength. The laminated film of the present invention includes a void-provided layerand a resin film, the void-provided layerbeing stacked on the resin film. The laminated film is produced by a production method, including steps of forming a void-provided structure', which is a precursor of the void-provided layeron the resin film; and causing a crosslinking reaction in the precursor′ after the precursor forming step. The precursor′ contains a substance that generates a basic substance by light irradiation or heating, the basic substance is not generated in the precursor forming step, the basic substance is generated by light irradiation or heating in the crosslinking reaction step, and the crosslinking reaction step has multiple stages.