The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2023

Filed:

Feb. 02, 2022
Applicant:

Palo Alto Research Center Incorporated, Palo Alto, CA (US);

Inventors:

Anne Plochowietz, Palo Alto, CA (US);

Bradley Rupp, San Francisco, CA (US);

Jengping Lu, Fremont, CA (US);

Julie A. Bert, East Palo Alto, CA (US);

Lara S. Crawford, Los Altos, CA (US);

Sourobh Raychaudhuri, Mountain View, CA (US);

Eugene M. Chow, Palo Alto, CA (US);

Matthew Shreve, Mountain View, CA (US);

Sergey Butylkov, Oakland, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81C 99/00 (2010.01); H01L 21/67 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
B81C 99/002 (2013.01); H01L 21/67271 (2013.01); H01L 21/67294 (2013.01); H01L 24/95 (2013.01); H01L 2224/95133 (2013.01); H01L 2224/95145 (2013.01); H01L 2924/1461 (2013.01); Y10T 29/49131 (2015.01); Y10T 29/5313 (2015.01);
Abstract

Disclosed are methods and systems of controlling the placement of micro-objects on the surface of a micro-assembler. Control patterns may be used to cause electrodes of the micro-assembler to generate dielectrophoretic (DEP) and electrophoretic (EP) forces which may be used to manipulate, move, position, or orient one or more micro-objects on the surface of the micro-assembler. The control patterns may be part of a library of control patterns.


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