The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2023

Filed:

Mar. 30, 2020
Applicant:

United Technologies Corporation, Farmington, CT (US);

Inventors:

Andrzej Ernest Kuczek, Bristol, CT (US);

Joseph C. Rampone, Colchester, CT (US);

Tahany Ibrahim El-Wardany, Bloomfield, CT (US);

Paul R. Faughnan, Jr., East Hampton, CT (US);

Assignee:

RAYTHEON TECHNOLOGIES CORPORATION, Farmington, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C21D 7/08 (2006.01); B24B 39/00 (2006.01); B21B 13/12 (2006.01); B23P 9/02 (2006.01);
U.S. Cl.
CPC ...
B24B 39/003 (2013.01); B21B 13/12 (2013.01); B23P 9/02 (2013.01); C21D 7/08 (2013.01);
Abstract

A method for deep roll peening a workpiece includes deep roll peening a workpiece by moving the workpiece along a feed path through multiple groups of opposed rollers that are arranged in series. Each group of opposed rollers includes a rim that defines a workpiece engagement surface that exerts a deep roll peening force on the workpiece. A deep roll peening system includes multiple groups of opposed rollers. Each of the opposed rollers is rotatably mounted and has a rim that defines a workpiece engagement surface. The workpiece engagement surfaces are spaced apart from each other by a gap. The groups are arranged in series such that the gaps define a feed path for receiving a workpiece into serial contact with the workpiece engagement surfaces.


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