The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2023

Filed:

Jan. 12, 2022
Applicant:

Shanghai Tianma Micro-electronics Co., Ltd., Shanghai, CN;

Inventors:

Dengming Lei, Shanghai, CN;

Kerui Xi, Shanghai, CN;

Zhenyu Jia, Shanghai, CN;

Ping Su, Shanghai, CN;

Huihui Jiang, Shanghai, CN;

Yi Wang, Shanghai, CN;

Wei Li, Shanghai, CN;

Huan Li, Shanghai, CN;

Feng Qin, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 3/36 (2006.01);
U.S. Cl.
CPC ...
H01Q 3/36 (2013.01);
Abstract

A scanning antenna is provided in the present disclosure. The scanning antenna includes a first substrate and a second substrate which are arranged oppositely; a liquid crystal layer between the first substrate and the second substrate; and a feed signal access terminal and a plurality of phase shift units, where the plurality of phase shift units is connected with each other, each phase shift unit is connected to the feed signal access terminal, and electrical lengths between at least two phase shift units and the feed signal access terminal are different. The present disclosure not only realizes one-dimensional wave beam scanning, but also has desirable scanning effect. The bias voltage is not needed to be independently applied to each phase shift unit, which can greatly simplify the bias voltage line configuration and be beneficial for reducing production cost and wiring difficulty.


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