The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2023

Filed:

Sep. 11, 2019
Applicants:

Beijing Boe Display Technology Co., Ltd., Beijing, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Bingqiang Gui, Beijing, CN;

Lianjie Qu, Beijing, CN;

Yonglian Qi, Beijing, CN;

Hebin Zhao, Beijing, CN;

Yun Qiu, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01); H01L 29/786 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66772 (2013.01); H01L 21/02488 (2013.01); H01L 21/02494 (2013.01); H01L 21/02598 (2013.01); H01L 29/78603 (2013.01); H01L 29/78654 (2013.01); H01L 21/02175 (2013.01); H01L 21/02189 (2013.01); H01L 21/02266 (2013.01); H01L 21/02491 (2013.01); H01L 21/02505 (2013.01); H01L 21/02516 (2013.01); H01L 21/02532 (2013.01); H01L 21/02609 (2013.01); H01L 21/02686 (2013.01); H01L 27/1214 (2013.01);
Abstract

Provided is a thin film transistor including a highly-textured dielectric layer, an active layer, a gate electrode and a source/drain electrode that are stacked on a base substrate. The source/drain electrode includes a source electrode and a drain electrode. The gate electrode and the active layer are insulated from each other. The source electrode and the drain electrode are electrically connected to the active layer. Constituent particles of the active layer are of monocrystalline silicon-like structures. According to the present disclosure, the highly-textured dielectric layer is adopted to replace an original buffer layer to induce the active layer to grow into a monocrystalline silicon-like structure, such that the performance of the thin film transistor is improved.


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