The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2023
Filed:
Jul. 04, 2019
Applicant:
Screen Holdings Co., Ltd., Kyoto, JP;
Inventors:
Sei Negoro, Kyoto, JP;
Kenji Kobayashi, Kyoto, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3213 (2006.01); H01L 21/02 (2006.01); H01L 21/3205 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/32134 (2013.01); H01L 21/02052 (2013.01); H01L 21/32055 (2013.01); H01L 21/67023 (2013.01); H01L 21/68764 (2013.01);
Abstract
An alkaline etchant containing a quaternary ammonium hydroxide, water, and an inhibitory substance for inhibiting contact between hydroxide ions generated from the quaternary ammonium hydroxide and objects Pto Pto be etched is prepared. The prepared etchant is supplied to a substrate in which the polysilicon-containing objects Pto Pto be etched and objects Oto Onot to be etched, which are different from the objects Pto Pto be etched, are exposed, thereby etching the objects Pto Pto be etched while preventing the objects Oto Onot to be etched from being etched.