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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11670485 B1

PDFFull Text
Date of Patent:
Jun. 06, 2023

Filed:

Aug. 20, 2019

Methods and apparatus for depositing aluminum by physical vapor deposition (pvd)

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Siew Kit Hoi, Singapore, SG;

Zhong Yaoying, Singapore, SG;

Xinxin Wang, Singapore, SG;

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:

Moser Taboada

Primary Examiner:

Jennifer Wecker

Assistant Examiner:

Patrick S Ott

Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/02 (2006.01); C23C 14/14 (2006.01); H01J 37/34 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32146 (2013.01); C23C 14/14 (2013.01); C23C 14/351 (2013.01); H01J 37/32724 (2013.01); H01J 37/3405 (2013.01); H01J 37/3455 (2013.01); H01L 21/02631 (2013.01); H01J 2237/332 (2013.01);
Abstract

Methods and apparatus for performing physical vapor deposition in a reactor chamber to form aluminum material on a substrate including: depositing a first aluminum layer atop a substrate to form a first aluminum region having a first grain size and a second aluminum layer atop the first aluminum layer, wherein the second aluminum layer has a second grain size larger than the first grain size; and depositing aluminum atop the second aluminum layer under conditions sufficient to increase the second grain size.

Find Patent Forward Citations

Hoi, Siew. (2023). Methods and apparatus for depositing aluminum by physical vapor deposition (pvd) (U.S. Patent No. 11670485). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11670485

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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