The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2023

Filed:

Jun. 08, 2020
Applicant:

Kwong Lung Enterprise Co., Ltd., Taipei, TW;

Inventors:

Jui-Wen Wang, Taipei, TW;

Chia-Hua Chang, Taipei, TW;

Chun-Lung Ho, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A41H 3/00 (2006.01); G06F 21/31 (2013.01); G06F 18/2431 (2023.01);
U.S. Cl.
CPC ...
G06F 21/31 (2013.01); A41H 3/007 (2013.01); G06F 18/2431 (2023.01); G06F 2221/2141 (2013.01);
Abstract

A clothing pattern making management system, applicable to a server and used for allowing users to connect and manage a plurality of clothing pattern making data via a network, at least including a database and a login and authority management module, a search and viewing module, a connection and upload module, and a management and download module. Through the data connection to a business system, the system is able to facilitate the users to perform data upload and management in order to achieve proper preservation and management of a large quantity of pattern drawings for various styles of clothes and for all stages, and to achieve the effects of learning exchange and passing on of techniques.


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