The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2023
Filed:
Sep. 05, 2017
Dow Global Technologies Llc, Midland, MI (US);
Rou Hua Chua, Singapore, SG;
Wu Aik Yee, Singapore, SG;
Bee Tin Low, Singapore, SG;
Muthu Selva Annamalai Subramanian, Singapore, SG;
Yutaka Maehara, Kanagawa, JP;
Jian Wang, Singapore, SG;
Dow Global Technologies LLC, Midland, MI (US);
Abstract
The present disclosure provides a process. In an embodiment, the process includes elongating a multilayer film to a impart a haze value greater than 30% to the multilayer film. The multilayer film has at least two layers: (A) a core layer composed of an ethylene/α-olefin multi-block copolymer and (B) a first skin layer in contact with the core layer, the skin layer composed of an ethylene-based polymer. The process includes releasing the elongating force from the elongated multilayer film to form a hazed multilayer film having a haze value greater than 30%. The process includes stretching the hazed multilayer film to form a stretched multilayer film having a clarity value greater than 80%. The process includes relaxing the stretch force from the stretched multilayer film to form a relaxed multilayer film having a haze value greater than 30%.