The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2023
Filed:
Nov. 22, 2018
Applicant:
Amorepacific Corporation, Seoul, KR;
Inventors:
Yeongran Lee, Yongin-si, KR;
Hyoung-June Kim, Yongin-si, KR;
Jun Seong Park, Yongin-si, KR;
Kyeonghwan Hwang, Yongin-si, KR;
Assignee:
AMOREPACIFIC CORPORATION, Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 36/82 (2006.01); A23L 33/105 (2016.01); A61K 8/9789 (2017.01); A61K 8/60 (2006.01); A61K 31/704 (2006.01); A61Q 19/08 (2006.01);
U.S. Cl.
CPC ...
A61K 36/82 (2013.01); A23L 33/105 (2016.08); A61K 8/602 (2013.01); A61K 8/9789 (2017.08); A61K 31/704 (2013.01); A61Q 19/08 (2013.01); A23V 2002/00 (2013.01);
Abstract
The present specification discloses a composition for external application to skin, containing a tea plant root extract as an active ingredient, for treatment of skin damage caused by fine dust, whereby the expression level of one or more selected from a group consisting of IL-36G (NM_019618), S100A7 (NM_002963), S100A8 (NM_002964) and XDH (NM_000379), which are genes in skin cells the expression level of which is affected by fine dust, is regulated to a normal level.