The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2023
Filed:
Jan. 16, 2020
Applicant:
Basf SE, Ludwigshafen, DE;
Inventors:
Janina Purschwitz, Bad Durkheim, DE;
Stephan Hüffer, Ludwigshafen, DE;
Alejandra Garcia Marcos, Ludwigshafen, DE;
Menno Hazenkamp, Riehen, CH;
Assignee:
BASF SE, Ludwigshafen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A01N 37/04 (2006.01); C08K 5/00 (2006.01); A01N 33/04 (2006.01); C08G 73/02 (2006.01); A01N 33/12 (2006.01); A01N 25/10 (2006.01); A01N 31/14 (2006.01); A01N 31/16 (2006.01); A01N 33/20 (2006.01); A01N 35/02 (2006.01);
U.S. Cl.
CPC ...
A01N 37/04 (2013.01); A01N 25/10 (2013.01); A01N 31/14 (2013.01); A01N 31/16 (2013.01); A01N 33/04 (2013.01); A01N 33/12 (2013.01); A01N 33/20 (2013.01); A01N 35/02 (2013.01); C08G 73/0206 (2013.01); C08K 5/0058 (2013.01);
Abstract
Disclosed are compositions comprising a) an antimicrobial agent, which is selected from the group consisting of biocides containing halogen atoms and/or containing phenolic moieties, formic acid, chlorine dioxide, chlorine dioxide generating compounds, dialdehydes; components containing an antimicrobial metal such as antimicrobial silver, and b) a polyamine, especially a polyethylenimine. The polyamine is effective as a booster for the antimicrobial agent.