The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2023

Filed:

Aug. 06, 2019
Applicant:

University of Maryland, College Park, College Park, MD (US);

Inventors:

Samira Aghayee, Washington, DC (US);

Mitchell Weikert, Lafayette Hill, PA (US);

Wolfgang Losert, Bethesda, MD (US);

Patrick Kanold, Bethesda, MD (US);

Assignee:

UNIVERSITY OF MARYLAND, COLLEGE PARK, College Park, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 9/31 (2006.01); G03B 21/20 (2006.01); G03B 21/14 (2006.01); G03H 1/02 (2006.01);
U.S. Cl.
CPC ...
H04N 9/3141 (2013.01); G03B 21/142 (2013.01); G03B 21/208 (2013.01); G03B 21/2033 (2013.01); G03H 2001/0224 (2013.01); G03H 2223/13 (2013.01);
Abstract

A method for displaying a modified phase mask on a spatial light modulator (SLM), including: modifying, by a processor, a phase mask by combining the phase mask with a virtual lens pattern, the virtual lens pattern having a focal length; displaying, by the SLM in communication with the processor, the modified phase mask on the SLM; and projecting, by a light source in communication with the processor, the light source through the SLM to form an intensity pattern at a distance from the SLM corresponding to the focal length of the virtual lens pattern, the intensity pattern being based on the phase mask.


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