The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2023

Filed:

Oct. 16, 2019
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

JaeMin Roh, Hwaseong-si, KR;

DaeYoun Kim, Daejeon, KR;

JulIl Lee, Cheonan-si, KR;

ChangMin Lee, Seoul, KR;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); H01J 37/32 (2006.01); H01L 21/02 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01); H01L 21/68 (2006.01); C23C 16/505 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32715 (2013.01); C23C 16/4585 (2013.01); H01J 37/32642 (2013.01); H01L 21/02274 (2013.01); H01L 21/6719 (2013.01); H01L 21/68 (2013.01); H01L 21/68764 (2013.01); C23C 16/45536 (2013.01); C23C 16/505 (2013.01); H01J 2237/20285 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3323 (2013.01);
Abstract

A substrate processing method capable of improving thin film uniformity on a substrate by controlling the position of a substrate supporting apparatus includes: a first operation of moving the substrate supporting apparatus in a first direction by a first predetermined distance; a second operation of moving the substrate supporting apparatus in a second direction by a second predetermined distance; a third operation of moving the substrate supporting apparatus in the second direction by the first predetermined distance; and a fourth operation of moving the substrate supporting apparatus in the first direction by the second predetermined distance, wherein the second direction may be opposite to the first direction.


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