The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2023

Filed:

Aug. 07, 2022
Applicant:

Borries Pte. Ltd., Singapore, SG;

Inventors:

Zhongwei Chen, Los Altos Hills, CA (US);

Wei Fang, Saratoga, CA (US);

Xiaoming Chen, Sunnyvale, CA (US);

Daniel Tang, Fremont, CA (US);

Liang-Fu Fan, Fremont, CA (US);

Assignee:

BORRIES PTE. LTD., Singapore, SG;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/09 (2006.01); H01J 37/073 (2006.01); H01J 37/317 (2006.01); H01J 37/28 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/09 (2013.01); H01J 37/073 (2013.01); H01J 37/28 (2013.01); H01J 37/3174 (2013.01); H01J 37/244 (2013.01); H01J 2237/0455 (2013.01); H01J 2237/0473 (2013.01);
Abstract

The present invention provides an apparatus of electron beam comprising an electron gun with a pinnacle limiting plate having at least one current-limiting aperture. The pinnacle limiting plate is located between a bottom (or lowest) anode and a top (or highest) condenser within the electron gun. A current (ampere) of the electron beam that has passed through the current-limiting aperture remains the same (unchanged) after the electron beam travels through the top condenser and an electron optical column and arrives at a sample space. Electron-electron interaction of the electron beam is thus reduced.


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