The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2023
Filed:
Oct. 11, 2019
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventor:
Mitsuhito Takahashi, Annaka, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C09K 3/14 (2006.01); B24B 37/04 (2012.01); C03C 19/00 (2006.01); C01F 17/206 (2020.01);
U.S. Cl.
CPC ...
C09K 3/1409 (2013.01); B24B 37/044 (2013.01); C01F 17/206 (2020.01); C03C 19/00 (2013.01); C09G 1/02 (2013.01); C01P 2004/04 (2013.01); C01P 2006/90 (2013.01);
Abstract
The present invention is polishing particles for polishing a synthetic quartz glass substrate. The polishing particles contain cerium-based polishing particles and have a breaking strength, which is measured by a compression tester, of 30 MPa or more. This provides polishing particles for polishing a synthetic quartz glass substrate while sufficiently reducing generation of defects due to polishing.