The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2023

Filed:

Jun. 02, 2021
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Hiroshi Kawafuji, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/21 (2006.01); G06K 15/10 (2006.01); B41J 2/52 (2006.01); H04N 1/405 (2006.01);
U.S. Cl.
CPC ...
B41J 2/2132 (2013.01); B41J 2/52 (2013.01); G06K 15/102 (2013.01); G06K 15/107 (2013.01); H04N 1/4055 (2013.01);
Abstract

For a multi-pass printing, an image of a unit area is printed by M printing scans of M print regions of first and second nozzle arrays. Each of N pieces of column data is printed by a different printing scan. Ejection data for the first nozzle array is generated using a first mask pattern and ejection data for the second nozzle array is generated using a second mask pattern different from the first mask pattern, for each of the N pieces of column data. On that basis, the first mask pattern and the second mask pattern have a complementary relationship in each of the M print regions. Further, in each of the first mask pattern and the second mask pattern, a combination of print regions, of the M print regions, for printing dots at the same position on the print medium has a mutually complementary relationship.


Find Patent Forward Citations

Loading…