The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2023
Filed:
Aug. 06, 2020
Semes Co., Ltd., Chungcheongnam-do, KR;
Dae Hyun Kim, Daejeon, KR;
Sae Won Na, Chungcheongbuk-do, KR;
Semes Co., Ltd., Chungcheongnam-do, KR;
Abstract
Provided are a substrate support unit capable of controlling a gradient between a center zone and an edge zone by adjusting impedances of center and edge electrodes constituting a lower electrode in a process chamber, and a substrate processing apparatus including the same. The substrate processing apparatus includes a housing, a shower head unit introduce a process gas for processing a substrate into the housing, and a support unit having an electrostatic chuck on which the substrate is mounted. The electrostatic chuck includes a dielectric plate constituting a body, a first heater configured to heat a first zone of the dielectric plate, and a second heater configured to heat a second zone of the dielectric plate. An etch rate for each zone of the substrate is controlled by adjusting an impedance or a voltage applied to each of the first heater and the second heater.