The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2023

Filed:

Aug. 01, 2018
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Jeong Ho Park, Daejeon, KR;

Bu Gon Shin, Daejeon, KR;

Eun Kyu Her, Daejeon, KR;

Jung Hwan Yoon, Daejeon, KR;

So Young Choo, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1847 (2013.01); G02B 5/1819 (2013.01);
Abstract

A method of manufacturing a module having multiple pattern areas, a module having multiple pattern areas according to the method, and a method of manufacturing a diffraction grating module or a mold for a diffraction grating module. The method of manufacturing a module having multiple pattern areas comprises: disposing a first substrate having a first pattern on a first base substrate; forming a first cutting line on the first substrate; forming a second cutting line on the first substrate; removing any one of a first area defined by the first cutting line and a second area defined by the second cutting line from the first substrate to form a removed area on the first substrate; disposing a second base substrate having a second pattern different from the first pattern in the removed area; and removing the first substrate from the base substrate without removing the first and second areas.


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