The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2023

Filed:

Dec. 31, 2019
Applicant:

Tsi Incorporated, Shoreview, MN (US);

Inventors:

Aaron Serafin Avenido, Minneapolis, MN (US);

Russell R. Graze, Dunlap, IL (US);

Jason Paul Johnson, Saint Paul, MN (US);

Robert C. Anderson, Glenmont, NY (US);

Assignee:

TSI Incorporated, Shoreview, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 35/00 (2006.01); G01N 1/38 (2006.01); G01N 1/20 (2006.01); G01N 1/22 (2006.01); G01N 15/10 (2006.01); G01N 15/14 (2006.01);
U.S. Cl.
CPC ...
G01N 35/00693 (2013.01); G01N 1/2035 (2013.01); G01N 1/38 (2013.01); G01N 1/2252 (2013.01); G01N 15/1012 (2013.01); G01N 2001/2255 (2013.01); G01N 2015/1486 (2013.01); G01N 2015/1493 (2013.01);
Abstract

Various embodiments include an exemplary apparatus and method for insitu calibration of multiple flow-sensing devices within a dilution system. In one example, a calibration and dilution system includes a first mass-flow device to serve as a global reference, a second mass-flow device configured to be coupled to and provide a supply of clean gas to a primary diluter, and a third mass-flow device configured to be coupled to and provide a supply of clean gas to a secondary diluter, where the diluters are pneumatically coupled to one another through a gas-supply line. Multiple valves are coupled to at least the mass-flow devices and the diluters. The calibration and dilution system is arranged so that the mass-flow controllers can be calibrated in-situ without having to remove any of the mass-flow controllers from the calibration and dilution system. Other apparatuses, designs, and methods are disclosed.


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