The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2023

Filed:

Nov. 21, 2019
Applicant:

The Procter & Gamble Company, Cincinnati, OH (US);

Inventors:

Rong Deng, Mason, OH (US);

Aleksey M. Pinyayev, Cincinnati, OH (US);

Valerie J. Henderson, Liberty Township, OH (US);

Craig A. Powell, Independence, KY (US);

Assignee:

THE PROCTER & GAMBLE COMPANY, Cincinnati, OH (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B29C 35/08 (2006.01); B29C 61/04 (2006.01); B32B 38/00 (2006.01); B32B 3/26 (2006.01); D04H 1/558 (2012.01); A61F 13/537 (2006.01); B32B 5/26 (2006.01); D04H 1/485 (2012.01);
U.S. Cl.
CPC ...
D04H 1/558 (2013.01); A61F 13/53708 (2013.01); B29C 61/04 (2013.01); B32B 3/266 (2013.01); B32B 5/26 (2013.01); B32B 38/0036 (2013.01); D04H 1/485 (2013.01); B29C 2035/0822 (2013.01); B32B 2038/0088 (2013.01);
Abstract

Aspects of the present disclosure relate to methods and apparatuses for relofting nonwoven substrates. During the relofting process, a substrate is directed to advance in a first direction such that a length of the substrate is in a facing relationship with a radiation source. The advancing substrate is relofted by irradiating the length of the substrate with infrared radiation from the infrared radiation source. The substrate comprises a first caliper upstream of the radiation source and the substrate comprises a second caliper downstream of the radiation source greater than the first caliper. The substrate may also be redirected around an axis to advance the substrate in a second direction, wherein the second direction is different than the first direction. The axis may be selectively movable between a first position and a second position to selectively subject the substrate to infrared radiation and remove the substrate from the infrared radiation.


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