The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2023
Filed:
Jun. 04, 2018
Kojundo Chemical Laboratory Co., Ltd., Sakado, JP;
Fumikazu Mizutani, Sakado, JP;
Shintaro Higashi, Sakado, JP;
KOJUNDO CHEMICAL LABORATORY CO., LTD., Sakado, JP;
Abstract
A precursor for chemical vapor deposition (CVD), which is a precursor for producing an indium oxide thin film by chemical vapor deposition, can be stored for a long period, and is easy to handle upon use when chemical vapor deposition is carried out; and a method for storing the precursor. A precursor for chemical vapor deposition, characterized by containing an alkylcyclopentadienylindium (I) (CHR—In) as a main component, also containing at least one component selected from alkylcyclopentediene (CHR), dialkylcyclopentadiene ((CHR)), trisalkylcyclopentadienylindium (III) ((CHR)—In) and triscyclopentadienyl indium (III) as secondary components (wherein Rto Rindependently represent an alkyl group having 1 to 4 carbon atoms), and containing substantially no solvents.