The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2023
Filed:
Mar. 20, 2018
Applicant:
Sharp Kabushiki Kaisha, Sakai, JP;
Inventors:
Yoshinobu Miyamoto, Sakai, JP;
Tohru Sonoda, Sakai, JP;
Assignee:
SHARP KABUSHIKI KAISHA, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); H01L 51/52 (2006.01); H01L 51/56 (2006.01); C23C 16/22 (2006.01);
U.S. Cl.
CPC ...
C23C 16/042 (2013.01); C23C 16/22 (2013.01); H10K 50/844 (2023.02); H10K 71/00 (2023.02);
Abstract
A film forming mask includes a plurality of first openings that are formed on the film-forming mask to form a thin film pattern on a substrate. A second opening includes a plurality of second openings that corresponds and is aligned along a side of at least one of the plurality of first openings. An opening area of the second opening is smaller than an opening area of each of the plurality of first openings.