The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2023
Filed:
Apr. 20, 2020
Applicant:
Kataoka Corporation, Kyoto, JP;
Inventor:
Junichi Matsumoto, Kyoto, JP;
Assignee:
KATAOKA CORPORATION, Kyoto, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12M 1/00 (2006.01); C12M 1/42 (2006.01); C12M 1/34 (2006.01);
U.S. Cl.
CPC ...
C12M 31/08 (2013.01); C12M 21/02 (2013.01); C12M 35/06 (2013.01); C12M 41/12 (2013.01);
Abstract
The present invention provides a cell culture base that avoids contact between a photoresponsive layer and cells. The cell culture base of the present invention includes: a support layer; a photoresponsive layer; and a cell culture layer, wherein the photoresponsive layer is laminated on the support layer, the cell culture layer is laminated on the photoresponsive layer, the photoresponsive layer contains a photoresponsive substance that causes at least one of heat and change in magnetism by light irradiation, and the cell culture layer is capable of culturing cells.