The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2023

Filed:

Oct. 15, 2020
Applicant:

Tdk Corporation, Tokyo, JP;

Inventors:

Toshio Asahi, Tokyo, JP;

Masamitsu Haemori, Tokyo, JP;

Hitoshi Saita, Tokyo, JP;

Assignee:

TDK CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B 35/465 (2006.01); C04B 35/47 (2006.01); H01G 4/10 (2006.01); H01G 4/12 (2006.01); C01G 23/00 (2006.01); C23C 16/40 (2006.01); C23C 16/06 (2006.01); C23C 16/56 (2006.01); H01G 4/33 (2006.01); H05K 1/18 (2006.01);
U.S. Cl.
CPC ...
C01G 23/006 (2013.01); C23C 16/06 (2013.01); C23C 16/409 (2013.01); C23C 16/56 (2013.01); H01G 4/10 (2013.01); H01G 4/33 (2013.01); H05K 1/185 (2013.01); C01P 2002/52 (2013.01); C01P 2002/72 (2013.01); C01P 2002/74 (2013.01); C01P 2006/40 (2013.01); H05K 2201/10015 (2013.01);
Abstract

A dielectric film includes a main component of a complex oxide represented by a general formula of (SrCa)TiO. 0.40≤x≤0.90 and 0.90≤y≤1.10 are satisfied. A ratio of a diffraction peak intensity on (1, 1, 2) plane of the complex oxide to a diffraction peak intensity on (0, 0, 4) plane of the complex oxide in an X-ray diffraction chart of the dielectric film is 3.00 or more. Instead, a ratio of an intensity of a diffraction peak appearing at a diffraction angle 2θ of 32° or more and 34° or less to an intensity of a diffraction peak appearing at a diffraction angle 2θ of 46° or more and 48° or less in an X-ray diffraction chart of the dielectric film obtained by an X-ray diffraction measurement with Cu-Kα ray as an X-ray source is 3.00 or more.


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