The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2023

Filed:

Apr. 26, 2018
Applicant:

Essilor International, Charenton-le-Pont, FR;

Inventors:

Mathieu Meynen, Charenton-le-Pont, FR;

Ludovic Jouard, Charenton-le-Pont, FR;

Marc Reignault, Charenton-le-Pont, FR;

Sira Uhalte Nogues, Charenton-le-Pont, FR;

Assignee:

Essilor International, Charenton-le-Pont, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01); B32B 37/10 (2006.01); B32B 37/12 (2006.01); B32B 37/14 (2006.01); B32B 38/00 (2006.01);
U.S. Cl.
CPC ...
B29D 11/00403 (2013.01); B29D 11/0073 (2013.01); B32B 37/1009 (2013.01); B32B 37/1018 (2013.01); B32B 37/12 (2013.01); B32B 37/1292 (2013.01); B32B 37/144 (2013.01); B32B 38/1875 (2013.01); B32B 2037/1253 (2013.01); B32B 2551/00 (2013.01);
Abstract

A method for manufacturing an optical article including the following steps: a. providing a first substrate with a main surface, b. depositing a second substrate on the main surface with an adhesive layer so that the space between the first substrate and second substrate is filled by the adhesive layer, c. curing the adhesive layer to induce a polymerization of the adhesive layer, wherein a tension step takes place after steps a. and b., and before step c., the tension step including applying symmetrically a tension, preferentially with a central symmetry, preferentially a radial isotropic tension or an ortho-distributed symmetrical tension, on the edges of the second substrate sensibly in a tension plan parallel to a plan representative of the main surface.


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