The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2023
Filed:
Oct. 12, 2018
Fujibo Holdings, Inc., Tokyo, JP;
Hirohito Miyasaka, Saijo, JP;
Teppei Tateno, Saijo, JP;
Ryuma Matsuoka, Saijo, JP;
Hiroshi Kurihara, Saijo, JP;
Takumi Mikuni, Saijo, JP;
Fujibo Holdings, Inc., Tokyo, JP;
Abstract
A polishing pad includes: a polishing layer having a polyurethane sheet containing substantially spherical cells, wherein E'(90%)/E′(30%) falls within a range of 0.4 to 0.7, where E′(90%) represents a storage modulus of the polyurethane sheet that has been exposed to an environment with a temperature of 23° C. and a relative humidity of 90%, as measured in a tension mode at 40° C. with an initial load of 148 g, a strain range of 0.1%, and a measurement frequency of 1.6 Hz, and E′(30%) represents a storage modulus of the polyurethane sheet that has been exposed to an environment with a temperature of 23° C. and a relative humidity of 30%, as measured in a tension mode at 40° C. with an initial load of 148 g, a strain range of 0.1%, and a measurement frequency of 1.6 Hz. Also provided is a method for manufacturing the polishing pad.