The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2023
Filed:
Apr. 07, 2020
Applicant:
Ap&c Advanced Powders & Coatings Inc., Boisbriand, CA;
Inventors:
Frederic Larouche, Saint-Colomban, CA;
Matthieu Balmayer, Montreal, CA;
Gabriel Dickson, Saint-Colomban, CA;
Assignee:
General Electric Company, Schenectady, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22F 9/14 (2006.01); B22F 1/065 (2022.01); B22F 1/142 (2022.01); B33Y 70/00 (2020.01); B22F 9/20 (2006.01);
U.S. Cl.
CPC ...
B22F 9/14 (2013.01); B22F 1/065 (2022.01); B22F 1/142 (2022.01); B33Y 70/00 (2014.12); B22F 9/20 (2013.01); B22F 2201/11 (2013.01); B22F 2202/13 (2013.01); B22F 2301/052 (2013.01); B22F 2301/15 (2013.01); B22F 2301/205 (2013.01); B22F 2301/35 (2013.01); B22F 2304/10 (2013.01);
Abstract
A powder treatment assembly and method for treating a feedstock powder of feedstock particles includes directing the feedstock powder into a plasma chamber within a reactor, exposing the feedstock powder to a plasma field generated by a plasma source to form a treated powder having treated particles with an increased average sphericity relative to the feedstock particles, and supplying a hot gas sheath flow downstream of the plasma chamber, the hot gas sheath flow substantially surrounding the treated powder.