The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2023

Filed:

Jun. 29, 2020
Applicants:

Hyundai Motor Company, Seoul, KR;

Kia Motors Corporation, Seoul, KR;

Inventor:

Jung Joo Park, Seoul, KR;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 3/34 (2006.01); C01B 3/48 (2006.01); B01J 19/24 (2006.01); C01B 3/56 (2006.01); B01D 53/047 (2006.01); B01J 19/00 (2006.01);
U.S. Cl.
CPC ...
B01J 19/2445 (2013.01); B01D 53/047 (2013.01); B01J 19/0013 (2013.01); C01B 3/48 (2013.01); C01B 3/56 (2013.01); B01D 2256/16 (2013.01); B01D 2257/30 (2013.01); B01D 2257/504 (2013.01); B01J 2219/00076 (2013.01); B01J 2219/00105 (2013.01); B01J 2219/00157 (2013.01); C01B 2203/0233 (2013.01); C01B 2203/0238 (2013.01); C01B 2203/0283 (2013.01); C01B 2203/042 (2013.01); C01B 2203/0811 (2013.01); C01B 2203/0883 (2013.01); C01B 2203/127 (2013.01); C01B 2203/141 (2013.01);
Abstract

A hydrogen reforming system is provided and includes a steam reforming system, a dry reforming system, and a water supply device. The steam reforming system is configured to (i) receive a raw material gas and react the raw material gas with water to generate a first mixed gas containing hydrogen and carbon monoxide, (ii) react the first mixed gas with the water to generate hydrogen and carbon dioxide, and (iii) discharge hydrogen and carbon dioxide. The dry reforming system is configured to (i) receive and react the raw material gas and the carbon dioxide discharged from the steam reforming system to generate a second mixed gas containing hydrogen, (ii) react the second mixed gas with the water to generate hydrogen and carbon dioxide, and (iii) discharge hydrogen and carbon dioxide. The water supply device is configured to supply the water to the steam reforming system and the dry reforming system.


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