The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2023

Filed:

Dec. 11, 2020
Applicant:

Ontos Equipment Systems, Inc., Chester, NH (US);

Inventors:

Robert Emmett Hughlett, Waterbury, VT (US);

Daniel Pascual, Wolcott, VT (US);

David Meyer, Jeffersonville, VT (US);

Michael Dow Stead, Jeffersonville, VT (US);

Assignee:

Ontos Equipment Systems, Inc., Chester, NH (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32825 (2013.01); H01J 37/32018 (2013.01); H01J 37/32449 (2013.01); H01J 2237/24564 (2013.01);
Abstract

An atmospheric pressure plasma system includes an atmospheric pressure plasma source that generates a glow discharge-type plasma. The atmospheric pressure plasma source comprises a plasma head and a gas sensor system. The plasma head includes a gas inlet, a gas passage surrounded by a dielectric liner, a radio frequency (RF) electrode and a ground electrode. The RF electrode and the ground electrode are arranged at opposite sides of an outer surface of a segment of the gas passage. The gas sensor system comprises a first pellistor that is exposed to a process gas entering the gas inlet and provides real-time monitoring of the presence and concentration of helium in the process gas entering the gas inlet during plasma operation.


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