The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2023

Filed:

Jul. 27, 2020
Applicant:

Raytheon Company, Waltham, MA (US);

Inventors:

Scott R. Sorbel, Tucson, AZ (US);

Clayton Spann, Corona de Tucson, AZ (US);

Robert D. Johnson, Tucson, AZ (US);

James A. McDaniel, Tucson, AZ (US);

William Barrett, III, Tucson, AZ (US);

Peter S. Ford, Tucson, AZ (US);

Assignee:

Raytheon Company, Waltham, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04B 17/10 (2015.01); G01R 29/08 (2006.01);
U.S. Cl.
CPC ...
H04B 17/103 (2015.01); G01R 29/0821 (2013.01);
Abstract

A measurement system utilizing metasurfaces and compressive sensing is provided that measures specular and diffuse RF reflection properties of a sample omnidirectionally across a broad frequency regime in a monostatic, bistatic, or BRDF sense. The measurement system may be used to measure the full hemispherical (or spherical) reflection from a target that has been illuminated in a monostatic or bistatic case. The measurement system may also be used to measure the full BRDF of a sample or spatially complex bistatic reflections from a sample.


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