The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2023

Filed:

Dec. 20, 2019
Applicant:

Trustees of Boston University, Boston, MA (US);

Inventors:

Yitao Liao, Redwood City, CA (US);

Theodore D. Moustakas, Dover, MA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/32 (2010.01); H01L 21/02 (2006.01); H01L 33/00 (2010.01); H01L 33/06 (2010.01); H01L 33/02 (2010.01);
U.S. Cl.
CPC ...
H01L 33/32 (2013.01); H01L 21/0237 (2013.01); H01L 21/0242 (2013.01); H01L 21/0254 (2013.01); H01L 21/0259 (2013.01); H01L 21/02458 (2013.01); H01L 21/02507 (2013.01); H01L 21/02573 (2013.01); H01L 21/02625 (2013.01); H01L 33/007 (2013.01); H01L 33/06 (2013.01); H01L 33/025 (2013.01);
Abstract

A method of growing an AlGaN semiconductor material utilizes an excess of Ga above the stoichiometric amount typically used. The excess Ga results in the formation of band structure potential fluctuations that improve the efficiency of radiative recombination and increase light generation of optoelectronic devices, in particular ultraviolet light emitting diodes, made using the method. Several improvements in UV LED design and performance are also provided for use together with the excess Ga growth method. Devices made with the method can be used for water purification, surface sterilization, communications, and data storage and retrieval.


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