The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2023
Filed:
Jul. 20, 2018
Hitachi High-tech Science Corporation, Tokyo, JP;
Ryusuke Hirose, Tokyo, JP;
Hideyuki Akiyama, Tokyo, JP;
Noriaki Sakai, Tokyo, JP;
Masafumi Watanabe, Tokyo, JP;
HITACHI HIGH-TECH SCIENCE CORPORATION, Tokyo, JP;
Abstract
Disclosed is an apparatus and method for analyzing an evolved gas, wherein the precision of detection of a gas component is improved without enlarging the apparatus. The apparatus includes a gas component evolving unit, a detection member for detecting the gas component, and a mixed gas channel for allowing a mixed gas containing the gas component and carrier gas to flow therethrough, and further includes a branch channel branched from the mixed gas channel, an inert gas channel for allowing an inert gas to flow therethrough, a first flow rate regulator for adjusting the flow rate of the carrier gas, a second flow rate regulator for adjusting the flow rate of the inert gas, and a flow rate control unit for controlling the second flow rate regulator such that the flow rate of the mixed gas guided to the detection member is a predetermined value.