The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2023

Filed:

May. 16, 2019
Applicants:

Toshiya Yamaguchi, Kanagawa, JP;

Toshiyuki Ikeoh, Miyagi, JP;

Inventors:

Toshiya Yamaguchi, Kanagawa, JP;

Toshiyuki Ikeoh, Miyagi, JP;

Assignee:

Ricoh Company, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/08 (2006.01); F21S 41/16 (2018.01); F21S 41/176 (2018.01); F21S 41/30 (2018.01); F21S 41/675 (2018.01); G02B 26/10 (2006.01); B29D 11/00 (2006.01); G03G 15/04 (2006.01); G02B 27/01 (2006.01); B29K 709/08 (2006.01); G01S 7/481 (2006.01); G01S 17/04 (2020.01); B60K 35/00 (2006.01);
U.S. Cl.
CPC ...
G02B 26/0833 (2013.01); B29D 11/0074 (2013.01); F21S 41/16 (2018.01); F21S 41/176 (2018.01); F21S 41/30 (2018.01); F21S 41/675 (2018.01); G01S 7/4817 (2013.01); G01S 17/04 (2020.01); G02B 26/10 (2013.01); G02B 27/0101 (2013.01); G03G 15/04036 (2013.01); B29K 2709/08 (2013.01); B60K 35/00 (2013.01); B60K 2370/1529 (2019.05);
Abstract

A light deflector, a method of manufacturing the light deflector, and an image projector. The light deflector and the method includes forming a first wafer provided with a plurality of movable mirror units, bonding the first wafer to be sandwiched between a second wafer on which a plurality of base units are formed and a third wafer on which a plurality of spacers are formed, bonding a fourth wafer on which a plurality of transparent members are formed on the third wafer, bonding a plurality of polyhedron light-beam adjusters on the fourth wafer such that one of the plurality of polyhedron light-beam adjusters and the movable mirror unit become a pair, and cutting a wafer layered product of the first to fourth wafers for each area in which the light deflector is formed. The image projector includes the light deflector, and an image is projected by optical scanning.


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