The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2023

Filed:

Oct. 04, 2021
Applicant:

Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno, 's-Gravenhage, NL;

Inventors:

Maarten Hubertus Van Es, Voorschoten, NL;

Hamed Sadeghian Marnani, Nootdorp, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 60/38 (2010.01); G01Q 60/24 (2010.01); G01Q 70/10 (2010.01); G01Q 20/04 (2010.01); G01Q 70/14 (2010.01);
U.S. Cl.
CPC ...
G01Q 60/38 (2013.01); G01Q 20/04 (2013.01); G01Q 70/10 (2013.01); G01Q 70/14 (2013.01);
Abstract

The surface of the atomic force microscopy (AFM) cantilever is defined by a main cantilever body and an island. The island is partly separated from the main body by a separating space between facing edges of the main body and the island. At least one bridge connects the island to the main body, along a line around which the island is able to rotate through torsion of the at least one bridge. The island has a probe tip located on the island at a position offset from said line and a reflection area. In an AFM a light source directs light to the reflection area and a light spot position detector detects a displacement of a light spot formed from light reflected by the reflection area, for measuring an effect of forces exerted on the probe tip.


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