The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2023
Filed:
Aug. 23, 2021
Applicant:
Hitachi High-tech Corporation, Tokyo, JP;
Inventors:
Assignee:
Hitachi High-Tech Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/3581 (2014.01);
U.S. Cl.
CPC ...
G01N 21/3581 (2013.01); G01N 2201/064 (2013.01); G01N 2201/0633 (2013.01); G01N 2201/0636 (2013.01); G01N 2201/0638 (2013.01); G01N 2201/06113 (2013.01);
Abstract
The present invention provides a far-infrared light source capable of reducing the shift in the location irradiated with far-infrared light even when the frequency of the far-infrared light changes. A far-infrared light source according to the present invention is configured so that the variation in the emission angle of far-infrared light in a nonlinear optical crystal when the frequency of the far-infrared light changes is substantially offset by the variation in the refractive angle of the far-infrared light at the interface between the nonlinear optical crystal and a prism when the frequency of the far-infrared light changes (see FIG.).