The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2023
Filed:
Jun. 21, 2021
Applicant:
SK Innovation Co., Ltd., Seoul, KR;
Inventors:
Nam Kyu Lee, Daejeon, KR;
Sun Young Kim, Daejeon, KR;
Kwang Kuk Lee, Daejeon, KR;
Jin Su Ham, Daejeon, KR;
Assignee:
SK Innovation Co., Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01); C09D 125/16 (2006.01); C09D 125/14 (2006.01); C09D 133/12 (2006.01); C09D 133/06 (2006.01); C08F 212/14 (2006.01); C08F 212/32 (2006.01); C08F 220/14 (2006.01); C09D 133/18 (2006.01); C08F 212/08 (2006.01);
U.S. Cl.
CPC ...
C08F 220/14 (2013.01); C08F 212/14 (2013.01); C08F 212/32 (2013.01); C09D 125/14 (2013.01); C09D 125/16 (2013.01); C09D 133/066 (2013.01); C09D 133/068 (2013.01); C09D 133/12 (2013.01); C09D 133/18 (2013.01); G03F 7/0002 (2013.01); G03F 7/2037 (2013.01); C08F 212/08 (2013.01); C08F 212/20 (2020.02);
Abstract
Provided are a random copolymer for forming a neutral layer promoting directed self-assembly pattern formation, a laminate for forming a pattern including the same, and a method for forming a high-quality pattern using the same.