The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2023
Filed:
Sep. 10, 2018
Applicant:
SK Enpulse Co., Ltd., Gyeonggi-do, KR;
Inventors:
Jang Won Seo, Busan, KR;
Hyuk Hee Han, Gyeonggi-do, KR;
Hye Young Heo, Gyeonggi-do, KR;
Joonsung Ryou, Gyeonggi-do, KR;
Young Pil Kwon, Gyeonggi-do, KR;
Assignee:
SK ENPULSE CO., LTD., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/24 (2012.01); C08J 9/12 (2006.01); C08J 9/32 (2006.01);
U.S. Cl.
CPC ...
B24B 37/24 (2013.01); C08J 9/122 (2013.01); C08J 9/32 (2013.01); C08J 2203/22 (2013.01); C08J 2205/044 (2013.01); C08J 2375/04 (2013.01);
Abstract
Embodiments relate to a porous polyurethane polishing pad for use in a chemical mechanical planarization and a process for preparing the same. It is possible to control the size and distribution of pores in the porous polyurethane polishing pad by using thermally expanded microcapsules and an inert gas as a gas phase foaming agent, whereby the polishing performance thereof can be adjusted.