The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 2023

Filed:

Feb. 25, 2021
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Shashank Shrikant Agashe, Bangalore, IN;

Gaurav Kumar, Bangalore, IN;

Priya Ranjan Sinha, Patna, IN;

Lakshmi Narayana Pedapudi, Bangalore, IN;

Avadhut Dipakrao Chaudhari, Bangalore, IN;

Dongwoo Lee, Hwasung-si, KR;

Taehyoung Lee, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/09 (2006.01); G01N 23/2273 (2018.01); G01N 23/2251 (2018.01);
U.S. Cl.
CPC ...
G01N 23/2273 (2013.01); G01N 23/2251 (2013.01); G01N 2223/335 (2013.01); G01N 2223/418 (2013.01); G01N 2223/646 (2013.01);
Abstract

Provided is a method for virtually executing an operation of an energy dispersive x-ray spectrometry (EDS) system in real time production line by analyzing a defect included in a material undergoing inspection based on computer vision, the method including receiving a scanning electron microscope (SEM) image of the material including the defect, extracting an image-feature from the SEM image of the material, classifying the extracted image-feature under a predetermined label, predicting, based on the classified image-feature, an element associated with the defect included in the material and a shape of the predicted element, and grading the defect included in the material based on comparing the predicted element with a predetermined criteria.


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