The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2023
Filed:
Aug. 05, 2020
Applicant:
Ichor Systems, Inc., Fremont, CA (US);
Inventors:
Sean Joseph Penley, Sparks, NV (US);
Zachariah Ezekiel McIntyre, Houston, TX (US);
Tyler James Wright, Reno, NV (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16K 47/08 (2006.01); F16L 55/027 (2006.01); G01F 1/86 (2006.01); G01F 5/00 (2006.01); F15D 1/02 (2006.01); G01F 1/40 (2006.01);
U.S. Cl.
CPC ...
G01F 1/86 (2013.01); F15D 1/025 (2013.01); F16K 47/08 (2013.01); F16L 55/0279 (2013.01); F16L 55/02727 (2013.01); G01F 1/40 (2013.01); G01F 5/00 (2013.01);
Abstract
Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor is disclosed, the flow restrictor constructed of a plurality of layers, one or more of the layers having a flow passage therein that extends from a first aperture at a first end of the flow restrictor to a second aperture at a second end of the flow restrictor.