The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2023
Filed:
Nov. 02, 2022
Applicant:
Fujifilm Electronic Materials U.s.a., Inc., N. Kingstown, RI (US);
Inventors:
Tomonori Takahashi, Shizuoka, JP;
Bing Du, Gilbert, AZ (US);
William A. Wojtczak, Mesa, AZ (US);
Thomas Dory, Gilbert, AZ (US);
Emil A. Kneer, Mesa, AZ (US);
Assignee:
Fujifilm Electronic Materials U.S.A., Inc., N. Kingstown, RI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/30 (2006.01); C11D 11/00 (2006.01); C11D 7/32 (2006.01); C11D 7/50 (2006.01); C11D 3/00 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
C11D 11/0047 (2013.01); C11D 3/0073 (2013.01); C11D 7/3218 (2013.01); C11D 7/3245 (2013.01); C11D 7/3281 (2013.01); C11D 7/5022 (2013.01); H01L 21/0206 (2013.01); H01L 21/02063 (2013.01); H01L 21/02068 (2013.01); H01L 21/02071 (2013.01); H01L 21/0273 (2013.01); H01L 21/31133 (2013.01);
Abstract
This disclosure relates to a cleaning composition that contains 1) hydroxylamine; 2) a chelating agent; 3) an alkylene glycol; 4) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.