The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2023
Filed:
May. 13, 2020
Lawrence Livermore National Security, Llc, Livermore, CA (US);
The Regents of the University of California, Oakland, CA (US);
Maxim Shusteff, Piedmont, CA (US);
James Oakdale, Castro Valley, CA (US);
Robert Matthew Panas, Dublin, CA (US);
Christopher M. Spadaccini, Oakland, CA (US);
Hayden K. Taylor, Berkeley, CA (US);
Brett Kelly, Berkeley, CA (US);
Indrasen Bhattacharya, Berkeley, CA (US);
Hossein Heidari, Berkeley, CA (US);
LAWRENCE LIVERMORE NATIONAL SECURITY, LLC, Livermore, CA (US);
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, Oakland, CA (US);
Abstract
Methods and materials for volumetric additive manufacturing, including computed axial lithography ('CAL'), using photosensitive resins comprising a photocurable resin prepolymer; a photoinitiator; and (optionally) a curing inhibitor. In various embodiments, such photosensitive polymers comprise (a) one or more monomer (or prepolymer) molecules, which form the backbone of the polymer network of the polymeric material and define its architecture; and (b) a photoinitiator that captures illumination energy and initiates polymerization.