The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 2023

Filed:

Jul. 20, 2018
Applicant:

Novelis Inc., Atlanta, GA (US);

Inventors:

Mehdi Shafiei, Farmington Hills, MI (US);

David Anthony Gaensbauer, Atlanta, GA (US);

Jeffrey Edward Geho, Marietta, GA (US);

Andrew James Hobbis, Bath, CA;

Steven L. Mick, Fairmont, WV (US);

Assignee:

Novelis Inc., Atlanta, GA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B21B 1/22 (2006.01); B21B 37/30 (2006.01); B21B 37/28 (2006.01); B21B 31/20 (2006.01); B21B 38/00 (2006.01); B21B 37/58 (2006.01); B21B 13/14 (2006.01); B21B 3/00 (2006.01); B21B 29/00 (2006.01); B21H 8/00 (2006.01);
U.S. Cl.
CPC ...
B21B 1/227 (2013.01); B21B 31/20 (2013.01); B21B 37/28 (2013.01); B21B 37/30 (2013.01); B21B 13/14 (2013.01); B21B 13/147 (2013.01); B21B 29/00 (2013.01); B21B 37/58 (2013.01); B21B 38/00 (2013.01); B21B 2001/228 (2013.01); B21B 2003/001 (2013.01); B21B 2261/14 (2013.01); B21B 2265/12 (2013.01); B21B 2267/10 (2013.01); B21H 8/005 (2013.01);
Abstract

A flatness control system includes a work stand of a finishing line, a plurality of actuators, a flatness measuring device, and a controller. The work stand includes a pair of vertically aligned work rolls. A first work roll of the pair of work rolls includes a plurality of flatness control zones configured to apply a localized pressure to a corresponding region on a substrate. Each actuator corresponds with a one of the plurality of flatness control zones. The flatness measuring device is configured to measure an actual flatness profile of the substrate. The controller is configured to adjust the plurality of actuators such that the localized pressures modify the actual flatness profile to achieve the desired flatness profile at the exit of the stand. The thickness and a length of the substrate remain substantially constant when the substrate exits the work stand.


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