The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2023

Filed:

Apr. 30, 2021
Applicant:

The Hong Kong University of Science and Technology, Hong Kong, CN;

Inventors:

Shoucheng Dong, Hong Kong, CN;

Yibin Jiang, Hong Kong, CN;

Siu Ting Tam, Hong Kong, CN;

Lei Lu, Hong Kong, CN;

Ching Wan Tang, Hong Kong, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); G03F 7/16 (2006.01); G03F 7/11 (2006.01); G03F 7/004 (2006.01); G03F 7/00 (2006.01); B05C 21/00 (2006.01);
U.S. Cl.
CPC ...
H10K 71/166 (2023.02); B05C 21/005 (2013.01); C23C 14/042 (2013.01); G03F 7/0035 (2013.01); G03F 7/0041 (2013.01); G03F 7/11 (2013.01); G03F 7/161 (2013.01); G03F 7/167 (2013.01); H10K 71/00 (2023.02); H10K 71/233 (2023.02);
Abstract

A shadow mask for patterned vapor deposition of an organic light-emitting diode (OLED) material includes a ceramic membrane under tensile stress with a plurality of through-apertures forming an aperture array through which a vaporized deposition material can pass. A multilayer peripheral support is attached to a rear surface with a hollow portion beneath the aperture array. A compressively-stressed interlayer balances the tensile stress of the ceramic membrane. A shadow mask module with multiple shadow masks is also provided and includes a rigid carrier having plural windows with a shadow mask positioned in each window. To make the module, shadow mask blanks are affixed to each carrier window followed by etching of apertures and support layers. In this way extremely flat masks with precise aperture patterns are formed.


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