The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2023

Filed:

Dec. 14, 2021
Applicant:

John Mezzalingua Associates, Llc, Liverpool, NY (US);

Inventors:

Sidharth Balasubramanian, Garland, TX (US);

Salah Ud Din Tariq, Allen, TX (US);

Assignee:

John Mezzalingua Associates, LLC, Liverpool, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01P 11/00 (2006.01); H01P 1/207 (2006.01); H01P 1/203 (2006.01); H01P 3/08 (2006.01); H01P 1/20 (2006.01);
U.S. Cl.
CPC ...
H01P 1/207 (2013.01); H01P 1/2002 (2013.01); H01P 1/203 (2013.01); H01P 3/08 (2013.01); H01P 11/006 (2013.01);
Abstract

A method of fabricating and tuning a surface integrated waveguide (SIW) filter incudes covering upper and lower surfaces of a dielectric substrate with a metallic layer. The method includes drilling a plurality of vias on the dielectric substrate and covering the vias with the metallic layer, wherein a first group of vias forms one or more cavity resonators, a second group of vias defines coupling channels between the cavity resonators, a third group of vias defines an effective width and a fourth group of vias defines an effective length of the cavity resonators. The method includes varying a center frequency by increasing diameters of the second group of vias to decrease the width of the coupling channels and varying a roll-off by increasing diameters of the third and fourth groups of vias to decrease the effective width and the effective length of the resonators.


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